| Kolb, T.; Schedl, A.E.; Kerschbaumer, H.; Niessner, N.; Schmidt, H.-W.; Wilhelmus, B.: De-Brominating Flame-Retardant Polystyrene by Utilizing Basic Oxides in Chemical Recycling, Chem. Ing. Technik 95(8), 1314-1322 (2023) -- DOI: 10.1002/cite.202200196 -- Details |
| Schäfer, P.; Hopmann, C.; Facklam, M.; Hollerbach, L.; Kolb, T.; Schedl, A.E.; Schmidt, H.-W.; Nosic, F.; Wilhelmus, B.: Continuous Chemical Recycling of Polystyrene with a Twin-Screw Extruder in Hopmann C., Dahlmann R. (eds): Advances in Polymer Processing, Springer Vieweg, 37-49 (2020) -- DOI: 10.1007/978-3-662-60809-8_4 -- Details |
| el Otell, Z.; Ringk, A.; Kolb, T.; Neuber, C.; Hansel, L.; de Marneffe, J.-F.: Molecular glass resist performance for nano-pattern transfer, Proceedings of SPIE - Advanced Etch Technology for Nanopatterning IV, 9428, 94280J (2015), doi:10.1117/12.2085828 -- Details |
| Neuber, C.; Ringk, A.; Kolb, T.; Wieberger, F.; Strohriegl, P.; Schmidt, H.-W.; Fookema, V.; Cooke, M.; Rawlings, C.; Düring, U.; Knoll, A.W.; de Marneffe, J.-F.; De Schepper, P.; Kästner, M.; Krivoshapkina, Y.; Budden, M.; Rangelow, I.W.: Molecular glass resists for scanning probe lithography, Proceedings of SPIE - Alternative Lithographic Technologies VI, 9049, 9094V-1 bis V-9 (2014) -- DOI: 10.1117/12.2047108 -- Details |
| Wieberger, F.; Kolb, T.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Nanopatterning with tailored molecules, Proceedings of SPIE - Advances in Patterning Materials and Processes XXXI, 9051, 90510G-1 bis G-11 (2014) -- DOI: 10.1117/12.2047109 -- Details |
| Wieberger, F.; Kolb, T.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Combinatorial Techniques to Efficiently Investigate and Optimize Organic Thin Film Processing and Properties, Molecules, 18(4), 4120-4139 (2013) -- DOI: 10.3390/molecules18044120 -- Details |
| Kolb, T.; Neuber, C.; Krysak, M.; Ober, C.K.; Schmidt, H.-W.: Multicomponent Physical Vapor Deposited Films with Homogeneous Molecular Material Distribution Featuring Improved Resist Sensitivity, Advanced Functional Materials, 22(18), 3865-3873 (2012) -- DOI: 10.1002/adfm.201103130 -- Details |
| Krysak, M.; Kolb, T.; Neuber, C.; Schmidt, H.-W.; Ober, C.K.: All-dry processible and PAG-attached molecular glasses for improved lithographic performance, Proceedings of SPIE, 7639, 76392C-8 (2010) -- DOI: 10.1117/12.848385 -- Details |
