Christian Neuber: Publications
-- 2024 -- |
|---|
| Schröder, D.; Neuber, C.; Mansfeld, U.; Kreger, K.; Schmidt, H.-W.: Mesostructured Nonwovens with Supramolecular Tricycloquinazoline Nanofibers as Heterogenous Photocatalyst, small science, 4(2), 2300160 (2024) -- DOI: 10.1002/smsc.202300160 -- Details |
-- 2023 -- |
| Bay, C.; Nagengast, N.; Schmidt, H.-W.; Döpper, F.; Neuber, C.: Environmental Assessment of Recycled Petroleum and Bio Based Additively Manufactured Parts via LCA in Kohl, H., Seliger, G., Dietrich, F. (eds): Manufacturing Driving Circular Economy, GCSM 2022. Lecture Notes in Mechanical Engineering, Springer, Cham. (2023) -- DOI: 10.1007/978-3-031-28839-5_75 -- Details |
| Nagengast, N.; Bay, C.; Döpper, F.; Schmidt, H.-W.; Neuber, C.: Thermo-Mechanical Recyclability of Additively Manufactured Polypropylene and Polylactic Acid Parts and Polypropylene Support Structures, Polymers 15, 2291 (2023) -- DOI: 10.3390/polym15102291 -- Details |
-- 2021 -- |
| Körber, T.; Krohn, F.; Neuber, C.; Schmidt, H.W.; Rössler, E.A.: Reorientational dynamics of highly asymmetric binary non-polymeric mixtures - a dielectric spectroscopy study, Physical Chemistry Chemical Physics, 23(12), 7200-12 (2021) -- DOI: 10.1039/d0cp06652d -- Details |
| Jin, M.; Stihl, M.; Giesa, R.; Neuber, C.; Schmidt, H.-W.: (AB)n segmented copolyetherimides for 4D printing, Macromolecular Materials and Engineering, 306(1), 2000473 (1-9) (2021) -- DOI: 10.1002/mame.202000473 -- Details |
| Koffi, A.; Toubal, L.; Jin, M.; Koffi, D.; Döpper, F.; Schmidt, H.-W.; Neuber, C.: Extrusion-based 3D printing with high-density polyethylene Birch-fiber composites, Journal of Applied Polymer Science, 139(15), 51937 (1-12) (2021) -- DOI: 10.1002/app.51937 -- Details |
-- 2020 -- |
| Jin, M.; Neuber, C.; Schmidt, H.W.: Tailoring polypropylene for extrusion-based additive manufacturing, Additive Manufacturing, 33, 101101 (1-13) (2020) -- DOI: 10.1016/j.addma.2020.101101 -- Details |
| Körber, T.; Krohn, F.; Neuber, C.; Schmidt, H.-W.; Rössler, E.A.: Main and secondary relaxations of non-polymeric high-Tg glass formers as revealed by dielectric spectroscopy, Physical Chemistry Chemical Physics, 22, 9086-97 (2020) -- DOI: 10.1039/D0CP00930J -- Details |
-- 2019 -- |
| Krohn, F.; Neuber, C.; Rössler, E.A.; Schmidt, H.-W.: Organic Glasses of High Glass Transition Temperatures Due To Substitution with Nitrile Groups, Journal of Physical Chemistry B, 123, 10286−93 (2019) -- DOI: 10.1021/acs.jpcb.9b08792 -- Details |
| Mohanraj, J.; Stihl, M.; Simon, E.; von Sicard, O.; Schmidt, G.; Fleischer, M.; Neuber, C.; Thelakkat, M.: Li-Salt-Free, Coevaporated Cu(TFSI)2Y-Doped Hole Conductors for Efficient CH3NH3PbI3 Perovskite Solar Cells, ACS Applied Energy Materials, 2(5), 3469-3478 (2019) -- DOI: 10.1021/acsaem.9b00260 -- Details |
| Schedl, A.E.; Probst, P.; Meichner, C.; Neuber, C.; Kador, L.; Fery, A.; Schmidt, H.-W.: Confinement templates for hierarchical nanoparticle alignment prepared by azobenzene-based surface relief gratings, Soft Matter 15, 3872-78 (2019) -- DOI: 10.1039/C8SM02585A -- Details |
-- 2018 -- |
| Schedl, A.E.; Neuber, C.; Fery, A.; Schmidt, H.W.: Controlled Wrinkling of Gradient Metal Films, Langmuir 34(47), 14249-14253 (2018) -- DOI: 10.1021/acs.langmuir.8b03123 -- Details |
| Jin, M.; Giesa, R.; Neuber, C.; Schmidt, H.W.: Filament Materials Screening for FDM 3D Printing by Means of Injection‐Molded Short Rods, Macromolecular Materials and Engineering, 303, 1800507 (2018) -- DOI: 10.1002/mame.201800507 -- Details |
| Lorenzoni, M.; Wagner, D.; Neuber, C.; Schmidt, H.W.; Perez-Murano, F.: Sub-30 nm patterning of molecular resists based on crosslinking through tip based oxidation, Applied Surface Science, 442, 106-113 (2018) -- DOI: 10.1016/j.apsusc.2018.02.096 -- Details |
-- 2016 -- |
| Neuber, C.; Schmidt, H.-W.; Strohriegl, P.; Wagner, D.; Krohn, F.; Schedl, A.E.; Bonanni, S.; Rawlings, C.; Düring, U.; Knoll, A.W.: PVD prepared molecular glass resists for scanning probe lithography, Proceedings of SPIE - Advances in Patterning Materials and Processes XXXIII, 9779, 97791C (2016), doi:10.1117/12.2219080 -- Details |
| Probst, C.; Meichner, C.; Kreger, K.; Kador, L.; Neuber, C.; Schmidt, H.-W.: Athermal Azobenzene-Based Nanoimprint Lithography, Advanced Materials, 28(13), 2624-2628 (2016) -- DOI: 10.1002/adma.201505552 -- Details |
-- 2015 -- |
| el Otell, Z.; Ringk, A.; Kolb, T.; Neuber, C.; Hansel, L.; de Marneffe, J.-F.: Molecular glass resist performance for nano-pattern transfer, Proceedings of SPIE - Advanced Etch Technology for Nanopatterning IV, 9428, 94280J (2015), doi:10.1117/12.2085828 -- Details |
| Meichner, C.; Schedl, A.E.; Neuber, C.; Kreger, K.; Schmidt, H.-W.; Kador, L.: Refractive-index determination of solids from first- and second-order critical diffraction angles of periodic surface patterns, AIP Advances, 5, 087135 (2015) -- DOI: 10.1063/1.4928654 -- Details |
| Neuber, C.; Schmidt, H.-W.; Strohriegl, P.; Ringk, A.; Kolb, T.; Schedl, A.E.; Fokkema, V.; van Veghel, M.G.A.; Cooke, M.; Rawlings, C.; Düring, U.; Knoll, A.; de Marneffe, J.-F.; el Otell, Z.; Kästner, M.; Krivoshapkina, Y.; Budden, M.; Rangelow, I.W.: Tailored molecular glass resists for Scanning Probe Lithography, Proceedings of SPIE - Advances in Patterning Materials and Processes XXXII, 9425, 94250E (2015), online: 2015-02-22, doi:10.1117/12.2085734 -- Details |
-- 2014 -- |
| With, S.; Trebbin, M.; Bartz, C.; Neuber, C.; Dulle, M.; Yu, S.; Roth, S.V.; Schmidt, H.-W.; Förster, S.: Fast Diffusion-Limited Lyotropic Phase Transitions Studied in Situ Using Continuous Flow Microfluidics/Microfocus-SAXS, Langmuir 30(42), 12494–12502 (2014) -- DOI: 10.1021/la502971m -- Details |
| Kästner, M.; Nieradka, K.; Ivanov, T.; Lenk, S.; Krivoshapkina, Y.; Ahmad, A.; Angelov, T.; Guliyev, E.; Reum, A.; Budden, M.; Hrasok, T.; Hofer, M.; Neuber, C.; Rangelow, I.W.: Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever, Proceedings of SPIE - Alternative Lithographic Technologies VI, 9049, 9049C-1 bis C-9 (2014) -- DOI: 10.1117/12.2046973 -- Details |
| Neuber, C.; Ringk, A.; Kolb, T.; Wieberger, F.; Strohriegl, P.; Schmidt, H.-W.; Fookema, V.; Cooke, M.; Rawlings, C.; Düring, U.; Knoll, A.W.; de Marneffe, J.-F.; De Schepper, P.; Kästner, M.; Krivoshapkina, Y.; Budden, M.; Rangelow, I.W.: Molecular glass resists for scanning probe lithography, Proceedings of SPIE - Alternative Lithographic Technologies VI, 9049, 9094V-1 bis V-9 (2014) -- DOI: 10.1117/12.2047108 -- Details |
| Wieberger, F.; Kolb, T.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Nanopatterning with tailored molecules, Proceedings of SPIE - Advances in Patterning Materials and Processes XXXI, 9051, 90510G-1 bis G-11 (2014) -- DOI: 10.1117/12.2047109 -- Details |
-- 2013 -- |
| Wieberger, F.; Kolb, T.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Combinatorial Techniques to Efficiently Investigate and Optimize Organic Thin Film Processing and Properties, Molecules, 18(4), 4120-4139 (2013) -- DOI: 10.3390/molecules18044120 -- Details |
-- 2012 -- |
| Wieberger, F.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Tailored Star Block Copolymer Architecture for High Performance Chemically Amplified Resists, Advanced Materials, 24(44), 5939-5944 (2012) -- DOI: 10.1002/adma.201201547 -- Details |
| Kolb, T.; Neuber, C.; Krysak, M.; Ober, C.K.; Schmidt, H.-W.: Multicomponent Physical Vapor Deposited Films with Homogeneous Molecular Material Distribution Featuring Improved Resist Sensitivity, Advanced Functional Materials, 22(18), 3865-3873 (2012) -- DOI: 10.1002/adfm.201103130 -- Details |
| Wieberger, F.; Forman, D.C.; Neuber, C.; Gröschel, A.H.; Böhm, M.; Müller, A.H.E.; Schmidt, H.-W.; Ober, C.K.: Tailored star-shaped statistical teroligomers via ATRP for lithographic applications, Journal of Materials Chemistry, 22, 73-79 (2012) -- DOI: 10.1039/c1jm11922b -- Details |
-- 2011 -- |
| Bauer, W.A.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Combinatorial Optimization of a Molecular Glass Photo Resist System for Electron Beam Lithography, Advanced Materials, 23(45), 5404-5408 (2011) -- DOI: 10.1002/adma.201103107 -- Details |
-- 2010 -- |
| Krysak, M.; Kolb, T.; Neuber, C.; Schmidt, H.-W.; Ober, C.K.: All-dry processible and PAG-attached molecular glasses for improved lithographic performance, Proceedings of SPIE, 7639, 76392C-8 (2010) -- DOI: 10.1117/12.848385 -- Details |
-- 2008 -- |
| Pfeiffer, F.; Felix, N.M.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Towards environmentally friendly, dry deposited, water developable molecular glass photoresists, Physical Chemistry Chemical Physics, 10, 1257 - 1262 (2008) -- DOI: 10.1039/b715819j -- Details |
| Pfeiffer, F.; Neuber, C.; Schmidt, H.-W.: All-dry photoresist systems: Physical vapor depositions of molecular glasses, Proceedings of SPIE 69231, 69231F/1-69231F/8 (2008) -- DOI: 10.1117/12.771101 -- Details |
-- 2007 -- |
| Kreger, K.; Bäte, M.; Neuber, C.; Schmidt, H.-W.; Strohriegl, P.: Combinatorial Development of Blue OLEDs Based on Star Shaped Molecules, Advanced Functional Materials, 17, 3456-3461 (2007) -- DOI: 10.1002/adfm.200700223 -- Details |
| Neuber, C.; Bäte, M.; Thelakkat, M.; Schmidt, H.-W.; Hänsel, H.; Zettl, H.; Krausch, G.: Combinatorial Preparation and Characterization of Thin-Film Multilayer Electro-Optical Devices, Review of Scientific Instruments, 78, 072216 1-11 (2007) -- DOI: 10.1063/1.2756993 -- Details |
| Pfeiffer, F.; Felix, N.M.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Physical Vapor Deposition of Molecular Glass Photoresists: A New Route to Chemically Amplified Patterning, Advanced Functional Materials, 17(14), 2336-2342 (2007) -- DOI: 10.1002/adfm.200600717 -- Details |
-- 2006 -- |
| Neuber, C.; Giesa, R.; Schmidt, H.-W.: Influence of Chain Stiffness and Preparation Methods on the Efficiency of Polyimide Alignment Layers for Liquid Crystal Orientation, Molecular Crystals Liquid Crystals, 461, 83-99 (2006) -- DOI: 10.1080/15421400601091359 -- Details |
| Neuber, C.; Schmidt, H.-W.; Giesa, R.: Polyimide Fibers Obtained by Spinning Lyotropic Solutions of Rigid-Rod Aromatic Poly(amic ethyl ester)s, Macromolecular Materials and Engineering, 291(11), 1315-1326 (2006) -- DOI: 10.1002/mame.200600256 -- Details |
| Neuber, C.; Bäte, M.; Giesa, R.; Schmidt, H.-W.: Combinatorial methods for the optimization of the vapor deposition of polyimide monomers and their polymerization, Journal of Materials Chemistry, 16(34), 3466 - 3477 (2006) -- DOI: 10.1039/b606091a -- Details |
-- 2004 -- |
| Bäte, M.; Neuber, C.; Giesa, R.; Schmidt, H.-W.: Combinatorial Investigation of the Vapor Deposition Polymerization of Aromatic Polyimides, Macromolecular Rapid Communications, 25, 371-376 (2004) |
| Neuber, C.; Giesa, R.; Schmidt, H.-W.: Lyotropic para-linked aromatic poly(amic ethyl ester)s as precursors for polyimides and their fibers, Polymeric Materials: Science & Engineering 90, 574 (2004) |
| Neuber, C.; Giesa, R.; Schmidt, H.-W.: Polyimide orientation layers prepared from lyotropic poly(amic ethyl ester)s, Polymeric Materials: Science & Engineering 90, 294 (2004) |
| Thelakkat, M.; Schmitz, C.; Neuber, C.; Schmidt, H.-W.: Materials screening and combinatorial development of thin film multilayer electro-optical devices, Macromolecular Rapid Communications, 25, 204-223 (2004) |
-- 2003 -- |
| Neuber, C.; Giesa, R.; Schmidt, H.-W.: Polyimide Orientation Layers Prepared from Lyotropic Aromatic Poly(Amic Ethyl Ester)s, Advanced Functional Materials, 5, 387-391 (2003) |
| Neuber, C.; Giesa, R.; Schmidt, H.-W.: Lyotropic Para-Linked Aromatic Poly(amic ethyl ester)s, Macromolecular Symposia, 199/1, 253-266 (2003) -- DOI: 10.1002/masy.200350922 |
-- 2002 -- |
| Neuber, C.; Giesa, R.; Schmidt, H.-W.: Synthesis and Properties of Lyotropic para-Linked Aromatic Poly(amic ethyl ester)s, Macromolecular Chemistry and Physics, 203, 598-604 (2002) |