| Neuber, C.; Ringk, A.; Kolb, T.; Wieberger, F.; Strohriegl, P.; Schmidt, H.-W.; Fookema, V.; Cooke, M.; Rawlings, C.; Düring, U.; Knoll, A.W.; de Marneffe, J.-F.; De Schepper, P.; Kästner, M.; Krivoshapkina, Y.; Budden, M.; Rangelow, I.W.: Molecular glass resists for scanning probe lithography, Proceedings of SPIE - Alternative Lithographic Technologies VI, 9049, 9094V-1 bis V-9 (2014) -- DOI: 10.1117/12.2047108 -- Details |
| Wieberger, F.; Kolb, T.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Nanopatterning with tailored molecules, Proceedings of SPIE - Advances in Patterning Materials and Processes XXXI, 9051, 90510G-1 bis G-11 (2014) -- DOI: 10.1117/12.2047109 -- Details |
| Wieberger, F.; Kolb, T.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Combinatorial Techniques to Efficiently Investigate and Optimize Organic Thin Film Processing and Properties, Molecules, 18(4), 4120-4139 (2013) -- DOI: 10.3390/molecules18044120 -- Details |
| Wieberger, F.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Tailored Star Block Copolymer Architecture for High Performance Chemically Amplified Resists, Advanced Materials, 24(44), 5939-5944 (2012) -- DOI: 10.1002/adma.201201547 -- Details |
| Wieberger, F.; Forman, D.C.; Neuber, C.; Gröschel, A.H.; Böhm, M.; Müller, A.H.E.; Schmidt, H.-W.; Ober, C.K.: Tailored star-shaped statistical teroligomers via ATRP for lithographic applications, Journal of Materials Chemistry, 22, 73-79 (2012) -- DOI: 10.1039/c1jm11922b -- Details |
| Forman, D.C.; Wieberger, F.; Gröschel, A.H.; Müller, A.H.E.; Schmidt, H.-W.; Ober, C.K.: Comparison of star and linear ArF resists, Proceedings of SPIE, 7639, 76390P (2010) -- DOI: 10.1117/12.848344 -- Details |
