| Wieberger, F.; Kolb, T.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Nanopatterning with tailored molecules, Proceedings of SPIE - Advances in Patterning Materials and Processes XXXI, 9051, 90510G-1 bis G-11 (2014) -- DOI: 10.1117/12.2047109 -- Details |
| Wieberger, F.; Kolb, T.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Combinatorial Techniques to Efficiently Investigate and Optimize Organic Thin Film Processing and Properties, Molecules, 18(4), 4120-4139 (2013) -- DOI: 10.3390/molecules18044120 -- Details |
| Wieberger, F.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Tailored Star Block Copolymer Architecture for High Performance Chemically Amplified Resists, Advanced Materials, 24(44), 5939-5944 (2012) -- DOI: 10.1002/adma.201201547 -- Details |
| Kolb, T.; Neuber, C.; Krysak, M.; Ober, C.K.; Schmidt, H.-W.: Multicomponent Physical Vapor Deposited Films with Homogeneous Molecular Material Distribution Featuring Improved Resist Sensitivity, Advanced Functional Materials, 22(18), 3865-3873 (2012) -- DOI: 10.1002/adfm.201103130 -- Details |
| Wieberger, F.; Forman, D.C.; Neuber, C.; Gröschel, A.H.; Böhm, M.; Müller, A.H.E.; Schmidt, H.-W.; Ober, C.K.: Tailored star-shaped statistical teroligomers via ATRP for lithographic applications, Journal of Materials Chemistry, 22, 73-79 (2012) -- DOI: 10.1039/c1jm11922b -- Details |
| Bauer, W.A.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Combinatorial Optimization of a Molecular Glass Photo Resist System for Electron Beam Lithography, Advanced Materials, 23(45), 5404-5408 (2011) -- DOI: 10.1002/adma.201103107 -- Details |
| Krysak, M.; Kolb, T.; Neuber, C.; Schmidt, H.-W.; Ober, C.K.: All-dry processible and PAG-attached molecular glasses for improved lithographic performance, Proceedings of SPIE, 7639, 76392C-8 (2010) -- DOI: 10.1117/12.848385 -- Details |
| Forman, D.C.; Wieberger, F.; Gröschel, A.H.; Müller, A.H.E.; Schmidt, H.-W.; Ober, C.K.: Comparison of star and linear ArF resists, Proceedings of SPIE, 7639, 76390P (2010) -- DOI: 10.1117/12.848344 -- Details |
| Pfeiffer, F.; Felix, N.M.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Towards environmentally friendly, dry deposited, water developable molecular glass photoresists, Physical Chemistry Chemical Physics, 10, 1257 - 1262 (2008) -- DOI: 10.1039/b715819j -- Details |
| Pfeiffer, F.; Felix, N.M.; Neuber, C.; Ober, C.K.; Schmidt, H.-W.: Physical Vapor Deposition of Molecular Glass Photoresists: A New Route to Chemically Amplified Patterning, Advanced Functional Materials, 17(14), 2336-2342 (2007) -- DOI: 10.1002/adfm.200600717 -- Details |
| Krishnan, S.; Paik, M.Y.; Ober, C.K.; Hexemer, A.; Sohn, K. E.; Kramer, E.J.; Häckel, M.; Kador, L.; Kropp, D.; Schmidt, H.-W.: Tailoring surface properties using functional side groups on block copolymers, Polymeric Materials: Science & Engineering 51(232nd ACS Meeting, ACS Paper), 105 (2006) |
| You, F.; Paik, M.Y.; Häckel, M.; Kador, L.; Kropp, D.; Schmidt, H.-W.; Ober, C.K.: Control and Suppression of Surface Relief Gratings in Liquid-Crystalline Perfluoroalkyl-Azobenzene Polymers, Advanced Functional Materials, 16, 1577-1581 (2006) -- DOI: 10.1002/adfm.200500711 |
