| el Otell, Z.; Ringk, A.; Kolb, T.; Neuber, C.; Hansel, L.; de Marneffe, J.-F.: Molecular glass resist performance for nano-pattern transfer, Proceedings of SPIE - Advanced Etch Technology for Nanopatterning IV, 9428, 94280J (2015), doi:10.1117/12.2085828 -- Details |
| Jones, A.O.F.; Knauer, P.; Resel, R.; Ringk, A.; Strohriegl, P.; Werzer, O.; Sferrazza, M.: Thermal Stability and Molecular Ordering of Organic Semiconductor Monolayers: Effect of an Anchor Group, ChemPhysChem, 16(8), 1712–1718 (2015) -- DOI: 10.1002/cphc.201500098 -- Details |
| Neuber, C.; Schmidt, H.-W.; Strohriegl, P.; Ringk, A.; Kolb, T.; Schedl, A.E.; Fokkema, V.; van Veghel, M.G.A.; Cooke, M.; Rawlings, C.; Düring, U.; Knoll, A.; de Marneffe, J.-F.; el Otell, Z.; Kästner, M.; Krivoshapkina, Y.; Budden, M.; Rangelow, I.W.: Tailored molecular glass resists for Scanning Probe Lithography, Proceedings of SPIE - Advances in Patterning Materials and Processes XXXII, 9425, 94250E (2015), online: 2015-02-22, doi:10.1117/12.2085734 -- Details |
| Singer, J.; Ringk, A.; Giesa, R.; Schmidt, H.-W.: Melt Electrospinning of Small Molecules, Macromolecular Materials and Engineering, 300, 259-276 (2015) -- DOI: 10.1002/mame.201400296 -- Details |
| Neuber, C.; Ringk, A.; Kolb, T.; Wieberger, F.; Strohriegl, P.; Schmidt, H.-W.; Fookema, V.; Cooke, M.; Rawlings, C.; Düring, U.; Knoll, A.W.; de Marneffe, J.-F.; De Schepper, P.; Kästner, M.; Krivoshapkina, Y.; Budden, M.; Rangelow, I.W.: Molecular glass resists for scanning probe lithography, Proceedings of SPIE - Alternative Lithographic Technologies VI, 9049, 9094V-1 bis V-9 (2014) -- DOI: 10.1117/12.2047108 -- Details |
| Ringk, A.; Roelofs, W.S.C.; Smits, E.C.P.; van der Marel, C.; Salzmann, I.; Neuhold, A.; Gelinck, G.H.; Resel, R.; de Leeuw, D.M.; Strohriegl, P.: n-Type self-assembled monolayer field-effect transistors for flexible organic electronics, Organic Electronics, 14(5), 1297-1304 (2013) -- DOI: 10.1016/j.orgel.2013.02.016 -- Details |
| Ringk, A.; Li, X.; Gholamrezaie, F.; Smits, E.C.P.; Neuhold, A.; Moser, A.; van der Marel, C.; Gelinck, G.H.; Resel, R.; de Leeuw, D.M.; Strohriegl, P.: N-Type Self-Assembled Monolayer Field-Effect Transistors and Complementary Inverters, Advanced Functional Materials, 23(16), 2016–2023 (2013) -- DOI: 10.1002/adfm.201202888 -- Details |
| Ringk, A.; Li, X.; Gholamrezaie, F.; Smits, E.C.P.; Neuhold, A.; Moser, A.; Gelinck, G.H.; Resel, R.; de Leeuw, D.M.; Strohriegl, P.: N-type self-assembled monolayer field-effect transistors, Proceedings of SPIE 8478(Organic Field-Effect Transistors XI) (2012) -- DOI: 10.1117/12.929535 -- Details |
| Bubel, S.; Ringk, A.; Strohriegl, P.; Schmechel, R.: N-type perylene to fill voids in solution processed nanoparticulate zinc oxide thin films, Physica E: Low-dimensional Systems and Nanostructures, 44(10), 2124-2127 (2012) -- DOI: 10.1016/j.physe.2012.06.027 -- Details |
